System CTP 85/120/140

 

 

 

The SYSTEM CTP development machine has been built under full respect of fiats ruled by EEC and concerning the machinery’s rules as of act 89/392 as subsequently modified.

 

 THERMAL PLATE PROCESSOR FROM COMPUTER TO PLATE SOLUTIONS AND CONVENTIONAL POSITIVE AND NEGATIVE PLATES

 

The machine has the following characteristics:

  Microprocessor controlled functions.
  Developing, rinsing, gumming, and drying.
  Developer efficiency display.
  Developer temperature adjustable and displayed.
  Brush in the rinse section.
  Automatic regeneration as a function of plate format.
  Automatic regeneration in stand by with anti-oxidation function.
  Developer tank level low indicator.
  Plate transport speed adjustable and displayed.
  N° 2 brushes in developer section.
  Developer brush speed adjustable and displayed; independent of  plate transport speed
  Squeeze rollers between developer and water rinse section.
  Automatic starting and stopping, when processing is complete, controlled by optical sensor.
  Plate re-entry access for rinsing, gumming and drying; also for paste retouching operations.
  Forced recirculation of developer with magnetic drive pump.
  Separate outlet for used developer (in compliance with antipollution regulations).
  Automatic periodic movement of rollers when the equipment is in stand by.
  Cooling unit for developer.
  Machine loading conveyor to facilitate insertion of plates by the CTP.
  Pair of submerged rollers in the centre part of the developer tank for transporting small size plates.
  Gumming with recirculation from original tank.
  Inversion of the direction of plate transport.
  Filtering of developer.
  Plate counter.
  Adjustable drying temperature.

On request of the client, the machine can be equipped with the following optionals:

  Automatic development
  Stacker with plate collector
  Recirculation of rinsing water: Neptune model
  Recirculation of rinsing water: Nautilus model
 

TECHNICAL CHARACTERISTICS

Mod. 85 Mod. 120 Mod. 140
Max. plate width
mm 840
mm 1160850
mm 1360
Min. plate length
mm 320
mm 320
mm 320
Plate gauge mm 0,12/0,50 mm 0,12/0,50 mm 0,12/0,50
Plate transport speed cm/min 20/80 cm/min 20/80 cm/min 20/80
Developer tank capacity
lt.30
lt.40
lt.50 
Water pipe connection
3/4"
3/4"
3/4"
Drain pipe
1"1/4
1"1/4
1"1/4
Approximate net weight

Kg 250

Kg 350

Kg 400

Electricity supply

3F 380 V + N + T

3F 380 V + N + T

3F 380 V + N + T

Power consumption
5 ampére
10 ampére
10 ampére
Cycle
50/60 Hz
50/60 Hz
50/60 Hz
 

SPECIAL FORMATS ON REQUEST

TECHNICAL CHARACTERISTICS

Mod. 155 Mod. 180
Max. plate width
mm 1500
mm 1750
Min. plate length
mm 320
mm 320
Plate gauge mm 0,12÷ 0,50 mm 0,12÷ 0,50
Plate transport speed cm/min 20/80 cm/min 20/80
Developer tank capacity
lt. 58
lt. 70
Water pipe connection
3/4"
3/4"
Drain pipe
1"1/4
1"1/4
Approximate net weight

Kg 550

Kg 620

Electricity supply

3F 380 V + N + T

3F 380 V + N + T

Power consumption
10 ampére
15 ampére
Cycle
50/60 Hz
50/60 Hz

System CTP details

 

 

BLOCK DIAGRAM OF PLATE PROCESSOR

   

 

SIDE SECTION

 
 
 
 

FRONT SECTION

 
 
 
 

DIMENSION REFERENCE

SIZE
MM
Mod.85
Mod.120 
Mod.140
A 600 700 800
B 1220 1220 1220
C 900 1200 1400
D - - -
E 1370 1710 1910
F 1130 1130 1130
G 970 1310 1510
H 200 200 200
I 450 450 450
L 680 680 680
 

SPECIAL FORMATS ON REQUEST

 

SIZE MM
Mod.155
Mod.
180
A 800 800
B 1220 1220
C 1400 1400
D - -
E 2060 2310
F 1130 1130
G 1660 1910
H 200 200
I 450 450
L 680 475

The firm reserves the rich to make changes and to carry out improvements in any moment and without notice.

 

 

 

 

SYSTEM CTP 85/120/140

Development of thermic plates 

(Computer to plate)

 

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LINEA AUTOMATICA

Equipment of LINEA AUTOMATICA